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Proceedings Paper

Revisiting F2 laser for DUV microlithography
Author(s): Thomas Hofmann; Jean-Marc Hueber; Palash P. Das; Scott Scholler
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Paper Abstract

A molecular fluorine laser, specifically tailored for photolithography needs, was developed. Single line operation at 157.6nm was achieved by means of a prism assembly. Laser operation at repetition rates up to 1 kHz without signs of power saturation results in an average power of 15W. The energy stability was equal to comparable ArF laser. Proper choice of materials and corona pre-ionization enabled gas lifetimes in line with current ArF laser technology, without any need for cryogenic purification.

Paper Details

Date Published: 26 July 1999
PDF: 6 pages
Proc. SPIE 3679, Optical Microlithography XII, (26 July 1999); doi: 10.1117/12.354365
Show Author Affiliations
Thomas Hofmann, Cymer, Inc. (United States)
Jean-Marc Hueber, Cymer, Inc. (United States)
Palash P. Das, Cymer, Inc. (United States)
Scott Scholler, Cymer, Inc. (United States)


Published in SPIE Proceedings Vol. 3679:
Optical Microlithography XII
Luc Van den Hove, Editor(s)

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