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Proceedings Paper

Watt-level DUV generation by solid state laser for lithography
Author(s): Yasu Ohsako; Jun Sakuma; Andrew Finch; Kyoichi Deki; Masahiro Horiguchi; Toshio Yokota
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Paper Abstract

The first all-solid-state laser system generating 1 W of 196 nm light at a 5-kHz pulse-repetition rate has been developed. The laser system consists of a Neodymium:Yttrium Lithium Fluoride maser oscillator power amplifier operating at 5 kHz, a single-frequency, gain-switched Titanium:sapphire laser, and additional frequency conversion stages utilizing nonlinear crystal such as Cesium Lithium Borate grown by USHIO and Lithium Triborate. The performance of each system component will discussed as well as the novel pathway employed to reach 196 nm.

Paper Details

Date Published: 26 July 1999
PDF: 7 pages
Proc. SPIE 3679, Optical Microlithography XII, (26 July 1999); doi: 10.1117/12.354361
Show Author Affiliations
Yasu Ohsako, USHIO Research Institute of Technology (Japan)
Jun Sakuma, USHIO Research Institute of Technology (Japan)
Andrew Finch, USHIO Research Institute of Technology (United States)
Kyoichi Deki, USHIO Research Institute of Technology, Inc. (Japan)
Masahiro Horiguchi, USHIO Research Institute of Technology, Inc. (Japan)
Toshio Yokota, USHIO Research Institute of Technology, Inc. (Japan)


Published in SPIE Proceedings Vol. 3679:
Optical Microlithography XII
Luc Van den Hove, Editor(s)

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