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Proceedings Paper

Customized off-axis illumination aperture filtering for sub-0.18-um KrF lithography
Author(s): Chin Chiu Hsia; Tsai-Sheng Gau; Chuen-Huei Yang; Ru-Gun Liu; ChungHsing Chang; Li-Jui Chen; Chien-Ming Wang; J. Fung Chen; Bruce W. Smith; Gue-Wuu Hwang; JiannWen Lay; Dong-Yuan Goang
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Paper Abstract

Off-axis illumination (OAI) has been shown as one of the most practical resolution enhancement techniques (RET) available for optical lithography. A customized off-axis illumination aperture filter (CIF) was designed to gain the benefits of OAI and keep the optical proximity effect (OPE) in a manage-able range for sub-0.18micrometers line and space patterns. The performance of the filter comparing with conventional, annular and quadruple illuminations in term of depth of focus, OPE, throughput, dose and power uniformity for both 0.18micrometers and 0.15micrometers NA Nikon KrF excimer laser stepper with a maximum partial coherence factor of 0.8 is presented in the paper. A brief description of the design principle of the filter is also given. A summarized conclusion on the weakness of the filter and possible improvements is also presented in the paper.

Paper Details

Date Published: 26 July 1999
PDF: 8 pages
Proc. SPIE 3679, Optical Microlithography XII, (26 July 1999); doi: 10.1117/12.354354
Show Author Affiliations
Chin Chiu Hsia, Industrial Technology Research Institute (Taiwan)
Tsai-Sheng Gau, Industrial Technology Research Institute (Taiwan)
Chuen-Huei Yang, Industrial Technology Research Institute (Taiwan)
Ru-Gun Liu, Industrial Technology Research Institute (Taiwan)
ChungHsing Chang, Industrial Technology Research Institute (Taiwan)
Li-Jui Chen, Industrial Technology Research Institute (Taiwan)
Chien-Ming Wang, Industrial Technology Research Institute (Taiwan)
J. Fung Chen, MicroUnity Systems Engineering, Inc. (United States)
Bruce W. Smith, Rochester Institute of Technology (United States)
Gue-Wuu Hwang, Industrial Technology Research Institute (Taiwan)
JiannWen Lay, Industrial Technology Research Institute (Taiwan)
Dong-Yuan Goang, Industrial Technology Research Institute (Taiwan)


Published in SPIE Proceedings Vol. 3679:
Optical Microlithography XII
Luc Van den Hove, Editor(s)

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