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Proceedings Paper

Resolution and DOF improvement through the use of square-shaped illumination
Author(s): Bruce W. Smith; Lena Zavyalova; S. G. Smith; John S. Petersen
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Paper Abstract

As optical lithography is pushed to smaller dimensions, methods of resolution enhancement are considered necessary. Illumination modification is getting a good deal of attention, through strong and weak off-axis methods. The shape of an illumination profile does not need to be circular, especially if X/Y feature orientation is considered. This paper describes the improvements in imaging that are possible through use of source shapes that have various degrees of square character. Applications are discussed and interaction with optical proximity correction, aberration, and other imagin factors are addressed.

Paper Details

Date Published: 26 July 1999
PDF: 12 pages
Proc. SPIE 3679, Optical Microlithography XII, (26 July 1999); doi: 10.1117/12.354352
Show Author Affiliations
Bruce W. Smith, Rochester Institute of Technology (United States)
Lena Zavyalova, Rochester Institute of Technology (United States)
S. G. Smith, Rochester Institute of Technology (United States)
John S. Petersen, International SEMATECH and Petersen Advanced Lithography (United States)

Published in SPIE Proceedings Vol. 3679:
Optical Microlithography XII
Luc Van den Hove, Editor(s)

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