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Proceedings Paper

Variations to the influence of lens aberration invoked with PSM and OAI
Author(s): Bruce W. Smith
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Paper Abstract

Through use of shorter wavelengths, larger numerical aperture lenses and resolution enhancement techniques optical extension may allow for attainment of geometry as small as 50 nm. As these trends continue, an appreciation of the influence that lens aberration has on imaging is required. Additionally, a fundamental understanding of the impact of various imaging approaches on aberration is needed. In this paper, we describe methods of interpretation that can lead to optimization of an imaging system under the influence of aberration where off-axis illumination or phase shift masking is utilized.

Paper Details

Date Published: 26 July 1999
PDF: 17 pages
Proc. SPIE 3679, Optical Microlithography XII, (26 July 1999); doi: 10.1117/12.354346
Show Author Affiliations
Bruce W. Smith, Rochester Institute of Technology (United States)


Published in SPIE Proceedings Vol. 3679:
Optical Microlithography XII
Luc Van den Hove, Editor(s)

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