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Proceedings Paper

Synergistic evolution to production-worthy 30-nm lithography
Author(s): Daniel R. Cote; James A. McClay; Noreen Harned
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Paper Abstract

The ever-increasing demand on circuit performance necessitates rapid deployment of optical lithographic as well as early production next generation lithographic tools. Successful execution of the multitude of development programs involved requires careful consideration and implementation of system architecture with special emphasis on program synergy and modularity. This paper presents performance data and system budgeting and allocation for current generation lithographic tools, and building from that basis, discusses evolutionary approaches for critical performance areas and modules. Supporting analytical results regarding performance of these modules are also discussed.

Paper Details

Date Published: 26 July 1999
PDF: 10 pages
Proc. SPIE 3679, Optical Microlithography XII, (26 July 1999); doi: 10.1117/12.354325
Show Author Affiliations
Daniel R. Cote, SVG Lithography Systems, Inc. (United States)
James A. McClay, SVG Lithography Systems, Inc. (United States)
Noreen Harned, SVG Lithography Systems, Inc. (United States)


Published in SPIE Proceedings Vol. 3679:
Optical Microlithography XII
Luc Van den Hove, Editor(s)

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