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Proceedings Paper

Long-term 193-nm laser-induced degradation of fused silica and calcium fluoride
Author(s): Vladimir Liberman; Mordechai Rothschild; Jan H. C. Sedlacek; Ray S. Uttaro; Allen Keith Bates; Chris K. Van Peski
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Paper Abstract

We have completed a comprehensive evaluation of bulk materials designed for 193-nm lithographic applications. These studies are performed at realistic fluences and pulse counts in excess of 6 X 109. The outcome of the study shows that most calcium fluoride materials should meet the industry lifetime targets for use in lens applications. Some fused silica material also appears to meet lifetime expectations of the industry; however, large grade-to-grade variability in both absorption and laser-induced densification has been observed. We also report on the impact of transient absorption in fused silica on lithographic dose control.

Paper Details

Date Published: 26 July 1999
PDF: 9 pages
Proc. SPIE 3679, Optical Microlithography XII, (26 July 1999); doi: 10.1117/12.354323
Show Author Affiliations
Vladimir Liberman, MIT Lincoln Lab. (United States)
Mordechai Rothschild, MIT Lincoln Lab. (United States)
Jan H. C. Sedlacek, MIT Lincoln Lab. (United States)
Ray S. Uttaro, MIT Lincoln Lab. (United States)
Allen Keith Bates, IBM Corp. and SEMATECH (United States)
Chris K. Van Peski, SEMATECH (United States)

Published in SPIE Proceedings Vol. 3679:
Optical Microlithography XII
Luc Van den Hove, Editor(s)

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