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Proceedings Paper

Performance of a highly stable 2-kHz operation KrF laser
Author(s): Tatsuo Enami; Masaki Nakano; Takayuki Watanabe; Ayako Ohbo; Tsukasa Hori; Takashi Ito; Toshihiro Nishisaka; Akira Sumitani; Osamu Wakabayashi; Hakaru Mizoguchi; Hiroaki Nakarai; Naoto Hisanaga; Takeshi Matsunaga; Hirokazu Tanaka; Tatsuya Ariga; Syouich Sakanishi; Takeshi Okamoto; Ryoichi Nodomi; Takashi Suzuki; Yuichi Takabayashi; Hitoshi Tomaru; Kiyoharu Nakao
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Paper Abstract

In the semiconductor industry, it is one of the most important issues to reduce manufacturing cost of the semiconductor device by increasing throughput. We have succeeded in the development of the high repetition rate excimer laser technology, and obtained the prospect of low CoO of the laser device. In this paper, we present the performance and advanced technologies of the newest model of the KrF excimer laser for microlithography; KLES-G20K. The laser achieves 20 W of output power with 0.6 pm bandwidth at 2 kHz. The pulse to pulse energy stability, 3 sigma is less than 6 percent and integrated energy stability is within +/- 0.4 percent. By our estimation, more than 50 percent of CoO of the laser device is cut by adopting developed machine compared to a present one.

Paper Details

Date Published: 26 July 1999
PDF: 9 pages
Proc. SPIE 3679, Optical Microlithography XII, (26 July 1999); doi: 10.1117/12.354313
Show Author Affiliations
Tatsuo Enami, Komatsu Ltd. (Japan)
Masaki Nakano, Komatsu Ltd. (Japan)
Takayuki Watanabe, Komatsu Ltd. (Japan)
Ayako Ohbo, Komatsu Ltd. (Japan)
Tsukasa Hori, Komatsu Ltd. (Japan)
Takashi Ito, Komatsu Ltd. (Japan)
Toshihiro Nishisaka, Komatsu Ltd. (Japan)
Akira Sumitani, Komatsu Ltd. (Japan)
Osamu Wakabayashi, Komatsu Ltd. (Japan)
Hakaru Mizoguchi, Komatsu Ltd. (Japan)
Hiroaki Nakarai, Komatsu Ltd. (Japan)
Naoto Hisanaga, Komatsu Ltd. (Japan)
Takeshi Matsunaga, Komatsu Ltd. (Japan)
Hirokazu Tanaka, Komatsu Ltd. (Japan)
Tatsuya Ariga, Komatsu Ltd. (Japan)
Syouich Sakanishi, Komatsu Ltd. (Japan)
Takeshi Okamoto, Komatsu Ltd. (Japan)
Ryoichi Nodomi, Komatsu Ltd. (Japan)
Takashi Suzuki, Komatsu Ltd. (Japan)
Yuichi Takabayashi, Komatsu Ltd. (Japan)
Hitoshi Tomaru, Komatsu Ltd. (Japan)
Kiyoharu Nakao, Komatsu Ltd. (Japan)


Published in SPIE Proceedings Vol. 3679:
Optical Microlithography XII
Luc Van den Hove, Editor(s)

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