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Proceedings Paper

High-repetition-rate excimer lasers for DUV lithography
Author(s): Uwe Stamm; Rainer Paetzel; Igor Bragin; Vincent Berger; Ingo Klaft; Juergen Kleinschmidt; Rustem Osmanov; Thomas Schroeder; Klaus Vogler; Wolfgang Zschocke; Dirk Basting
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Paper Abstract

With the transition of DUV lithography into mass production, the economics of the excimer laser light sources is getting more important. The efforts in the development are directed towards an increase of the laser's repetition rate and output power for higher wafer throughput and an improvement of the component lifetime in order to reduce the cost of laser operation. Here we describe advanced 248 nm and 193 nm laser systems which operate with repetition rates of 2 kHz to be used in conjunction with refractive, partially achromatic refractive and catadioptric lithographic lenses, respectively.

Paper Details

Date Published: 26 July 1999
PDF: 8 pages
Proc. SPIE 3679, Optical Microlithography XII, (26 July 1999); doi: 10.1117/12.354310
Show Author Affiliations
Uwe Stamm, Lambda Physik GmbH (Germany)
Rainer Paetzel, Lambda Physik GmbH (Germany)
Igor Bragin, Lambda Physik GmbH (Germany)
Vincent Berger, Lambda Physik GmbH (France)
Ingo Klaft, Lambda Physik GmbH (Germany)
Juergen Kleinschmidt, Lambda Physik GmbH (Germany)
Rustem Osmanov, Lambda Physik GmbH (Germany)
Thomas Schroeder, Lambda Physik GmbH (Germany)
Klaus Vogler, Lambda Physik GmbH (Germany)
Wolfgang Zschocke, Lambda Physik GmbH (Germany)
Dirk Basting, Lambda Physik GmbH (United States)


Published in SPIE Proceedings Vol. 3679:
Optical Microlithography XII
Luc Van den Hove, Editor(s)

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