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Proceedings Paper

Production-ready 2-kHz KrF excimer laser for DUV lithography
Author(s): Dave Myers; Tom A. Watson; Palash P. Das; Gunasiri G. Padmabandu; Paolo Zambon; Thomas Hofmann; William N. Partlo; Christopher Hysham; Richard Dunning
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Paper Abstract

Now that 1000 Hz KrF excimer laser based DUV lithography tools are firmly established in production, emphasis is shifting from development towards improving the productivity and profitability of the manufacturing process, thereby reducing the cost per wafer. In this arena, laser manufacturers are competing now not only on performance but also on cost and productivity enhancements that the laser can offer to the lithography process.

Paper Details

Date Published: 26 July 1999
PDF: 12 pages
Proc. SPIE 3679, Optical Microlithography XII, (26 July 1999); doi: 10.1117/12.354309
Show Author Affiliations
Dave Myers, Cymer, Inc. (United States)
Tom A. Watson, Cymer, Inc. (United States)
Palash P. Das, Cymer, Inc. (United States)
Gunasiri G. Padmabandu, Cymer, Inc. (United States)
Paolo Zambon, Cymer, Inc. (United States)
Thomas Hofmann, Cymer, Inc. (United States)
William N. Partlo, Cymer, Inc. (United States)
Christopher Hysham, Cymer, Inc. (United States)
Richard Dunning, Cymer, Inc. (United States)

Published in SPIE Proceedings Vol. 3679:
Optical Microlithography XII
Luc Van den Hove, Editor(s)

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