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Proceedings Paper

Advanced resist coating technology for mask manufacturing process
Author(s): Yasuyuki Kushida; Youichi Usui; Toru Kobayashi; Kazumasa Shigematsu
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Paper Abstract

In mask manufacturing, resist coating is one of the most important processes for fine pattern making because the pattern CD uniformity largely depends on the resist film accuracy. In recent years, various spin coating methods, we have found that the rotary cup method is the best choice to meet our requirements. The method has various advantages in comparison with the other ones. On the other hand, there is a problem of film thickness variations, which are specific to certain types of resist, with this method. In our study, we established a new coating technique which solved the problem mentioned above, without sacrificing the advantages of the rotary cup method. This new method is very effective for resist coating and can be applied to mask fabrication for the next generation devices including 230 mm masks.

Paper Details

Date Published: 26 July 1999
PDF: 8 pages
Proc. SPIE 3679, Optical Microlithography XII, (26 July 1999); doi: 10.1117/12.354304
Show Author Affiliations
Yasuyuki Kushida, Fujitsu Labs. Ltd. (Japan)
Youichi Usui, Fujitsu Labs. Ltd. (Japan)
Toru Kobayashi, Fujitsu Labs. Ltd. (Japan)
Kazumasa Shigematsu, Fujitsu Labs. Ltd. (Japan)

Published in SPIE Proceedings Vol. 3679:
Optical Microlithography XII
Luc Van den Hove, Editor(s)

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