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Proceedings Paper

CMOS integrated microsystems and nanosystems
Author(s): Henry Baltes; Oliver Brand
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Paper Abstract

We review selected micro- and nano-systems developed recently at the Physical Electronics Laboratory of ETH Zurich using industrial CMOS technology in combination with post-processing micromachining and film deposition: (1) an infrared sensor microsystem for presence detection of persons, (2) calorimetric, capacitive, and gravimetric chemical sensor microsystems for detection of volatile organic compounds in air, and (3) a parallel scanning AFM chip. The microsystems combine sensor structures and read- out circuitry on a single chip.

Paper Details

Date Published: 20 July 1999
PDF: 9 pages
Proc. SPIE 3673, Smart Structures and Materials 1999: Smart Electronics and MEMS, (20 July 1999); doi: 10.1117/12.354257
Show Author Affiliations
Henry Baltes, ETH Zurich (Switzerland)
Oliver Brand, ETH Zurich (Switzerland)


Published in SPIE Proceedings Vol. 3673:
Smart Structures and Materials 1999: Smart Electronics and MEMS
Vijay K. Varadan, Editor(s)

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