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Proceedings Paper

Optical investigations of Cr and CrN layers obtained by magnetron sputtering in ion-beam-assisted deposition process (IBAD)
Author(s): Waldemar Oleszkiewicz; Ewa Oleszkiewicz; Krystyna Zukowska
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Paper Abstract

In the ion beam deposition process the source of material was Cr target subjected to magnetron sputtering. Cr and CrN layers deposition processes were carried out in the presence of Ar and Ar + N2 ions atmosphere. The optical investigations of Cr and CrN layers obtained by IBAD processes were made to estimate the efficiency of such modifying factor as ion beam bombardment. The optical constants n and k were determined by ellipsometry for Cr and CrN layers deposited onto grounded or negatively biased (bias voltages from 0 to 500 V) BK7 glass substrates.

Paper Details

Date Published: 14 July 1999
PDF: 6 pages
Proc. SPIE 3820, 11th Slovak-Czech-Polish Optical Conference on Wave and Quantum Aspects of Contemporary Optics, (14 July 1999); doi: 10.1117/12.353095
Show Author Affiliations
Waldemar Oleszkiewicz, Wroclaw Univ. of Technology (Poland)
Ewa Oleszkiewicz, Wroclaw Univ. of Technology (Poland)
Krystyna Zukowska, Wroclaw Univ. of Technology (Poland)


Published in SPIE Proceedings Vol. 3820:
11th Slovak-Czech-Polish Optical Conference on Wave and Quantum Aspects of Contemporary Optics
Miroslav Hrabovsky; Anton Strba; Waclaw Urbanczyk, Editor(s)

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