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Proceedings Paper

Pulsed laser deposition of Ti:sapphire thin films using high-speed rotating target
Author(s): Yoshiki Nakata; Hiroshi Uetsuhara; Satoshi Goto; Nilesh J. Vasa; Tatsuo Okada; Mitsuo Maeda
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Paper Abstract

We describe the deposition of Ti:sapphire thin films by the pulsed-laser deposition (PLD) method for the waveguide laser application, with an emphasis on the reduction of droplets which is inevitably generate during PLD. In order to eliminate the droplets for the film surface, we introduced centrifugal separation of the droplets out of the laser ablation plume using a high-speed rotating target. The behavior of droplets in the ablation plume generated with a high-speed rotating target is presented along with the film properties.

Paper Details

Date Published: 15 July 1999
PDF: 8 pages
Proc. SPIE 3618, Laser Applications in Microelectronic and Optoelectronic Manufacturing IV, (15 July 1999); doi: 10.1117/12.352721
Show Author Affiliations
Yoshiki Nakata, Kyushu Univ. (Japan)
Hiroshi Uetsuhara, Kyushu Univ. (Japan)
Satoshi Goto, Kyushu Univ. (Japan)
Nilesh J. Vasa, Kyushu Univ. (Japan)
Tatsuo Okada, Kyushu Univ. (Japan)
Mitsuo Maeda, Kyushu Univ. (Japan)

Published in SPIE Proceedings Vol. 3618:
Laser Applications in Microelectronic and Optoelectronic Manufacturing IV
Jan J. Dubowski; Henry Helvajian; Ernst-Wolfgang Kreutz; Koji Sugioka, Editor(s)

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