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Proceedings Paper

Second harmonic of Ti:sapphire femtosecond laser as a possible tool for pointlike 3D optical information recording
Author(s): Nikita M. Bityurin; Alexey I. Korytin; Sergey V. Muraviov; Alexander M. Yurkin
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Paper Abstract

We show that irradiation by the second harmonic (SH) of Ti:Sapphire femtosecond laser provides well-defined spots with micrometer diameter by controllable manner in pure PMMA. Combined effect of SH and fundamental frequency (FF) radiation of Ti:Sapphire laser yields significant decrease in recording time. These results relate to 3D bitwise optical information storage. Usually in order to produce irreversible detectable changes, either single amplified Ultra-Short Laser Pulse (USLP) irradiation of pure matrix or multi-shot irradiation of matrix with dyes by nonamplified USLP is employed. In our present experiments the 1.5 percent transformation of nonamplified Ti:Sapphire laser radiation into the Sh has been obtained by means of BBO crystal with thickness of 300micrometers . The SH beam was then focused within the PMMA matrix by a lens with NA equals 0.55. The onset of emission corresponds to the onset of detectable irreversible changes in PMMA detected by optical microscope. The SH provides two-photon electronic transition to the absorption band of PMMA. Theoretical analysis of experimental data shows that preliminary matrix excitation by SH is followed by a self-developing process. This process can be driven not only by SH radiation but by potentially more powerful FF radiation as well.

Paper Details

Date Published: 15 July 1999
PDF: 8 pages
Proc. SPIE 3618, Laser Applications in Microelectronic and Optoelectronic Manufacturing IV, (15 July 1999); doi: 10.1117/12.352712
Show Author Affiliations
Nikita M. Bityurin, Institute of Applied Physics (Russia)
Alexey I. Korytin, Institute of Applied Physics (Russia)
Sergey V. Muraviov, Institute of Applied Physics (Russia)
Alexander M. Yurkin, Institute of Minerals and Petrography (Russia)


Published in SPIE Proceedings Vol. 3618:
Laser Applications in Microelectronic and Optoelectronic Manufacturing IV
Jan J. Dubowski; Henry Helvajian; Ernst-Wolfgang Kreutz; Koji Sugioka, Editor(s)

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