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Proceedings Paper

Atom projector: basic concept, construction, and applications
Author(s): Nikolay M. Sovetov; Anatoly V. Nikonov; Dmitry A. Grigoriev; Andrey V. Khobotov; Victor A. Moskovsky; Elena V. Naumova
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Paper Abstract

The problems of the atom beam formation and its application to the micro- and nanoelectronic manufacturing are considered. The method introducing a useful information into the structured atom beam and focusing this beam is described. This method named the atom projection is relevant to atom optics. Negative detuned laser radiation field controls the beam. Features of the cooling, structuring, information input, focusing processes are discussed. The scheme of the plant using the atom beam with adjustable density distribution. The atom beam cross-section and the processed area are shaped according to the desired profile. The scheme of the atom projector and the functions of its units are described. The spatial resolution of processing and the resolution of surface analysis are evaluated to be about 10 nm and 1 nm correspondingly. Presented process is maskless, in-situ, with high output rating. The atom projector can be applied for the manufacturing, analysis and in-line reconstruction of the IC as well as for basic researchers of matter. Authors consider the nanoelectronic chip manufacturing as the most perspective application for the atom projector.

Paper Details

Date Published: 15 July 1999
PDF: 8 pages
Proc. SPIE 3618, Laser Applications in Microelectronic and Optoelectronic Manufacturing IV, (15 July 1999); doi: 10.1117/12.352711
Show Author Affiliations
Nikolay M. Sovetov, Saratov State Technical Univ. (Russia)
Anatoly V. Nikonov, Saratov State Technical Univ. (Russia)
Dmitry A. Grigoriev, Saratov State Technical Univ. (Russia)
Andrey V. Khobotov, Saratov State Technical Univ. (Russia)
Victor A. Moskovsky, Saratov State Technical Univ. (Russia)
Elena V. Naumova, Saratov State Technical Univ. (Russia)

Published in SPIE Proceedings Vol. 3618:
Laser Applications in Microelectronic and Optoelectronic Manufacturing IV
Jan J. Dubowski; Henry Helvajian; Ernst-Wolfgang Kreutz; Koji Sugioka, Editor(s)

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