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Proceedings Paper

EUCLIDES: the European EUVL program
Author(s): Jozef P. H. Benschop; Winfried M. Kaiser; David C. Ockwell
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Paper Abstract

A new European research program named EUCLIDES (Extreme UV Concept Lithography Development System) has been started in August 1998. The program headed by ASM Lithography (ASML), partnered by Carl Zeiss and Oxford Instruments, is evaluating EUVL as a viable lithographic solution for resolutions of 70 nm and below. This paper gives an overview of program objectives and status, including a summary of recent highlights.

Paper Details

Date Published: 25 June 1999
PDF: 7 pages
Proc. SPIE 3676, Emerging Lithographic Technologies III, (25 June 1999); doi: 10.1117/12.351165
Show Author Affiliations
Jozef P. H. Benschop, ASML (Netherlands)
Winfried M. Kaiser, Carl Zeiss (Germany)
David C. Ockwell, Oxford Instruments Ltd. (United Kingdom)

Published in SPIE Proceedings Vol. 3676:
Emerging Lithographic Technologies III
Yuli Vladimirsky, Editor(s)

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