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Proceedings Paper

Local thermal analysis of reaction and the glass transition in exposed resist
Author(s): David S. Fryer; Juan J. de Pablo; Paul F. Nealey
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Paper Abstract

We report the results of an in situ study of reaction and the glass transition in exposed films of positive chemically amplified resists. Local thermal analysis was performed on exposed patterns in thin films of APEX-E. We measure the activation energy of reaction int he exposed resist to be 132 +/- 5 kJ/mol. Post-exposure delay effects were shown to reduce the reaction rate in the pattern by as much as 14 percent. Finally, we used local thermal analysis to determine the effect of reaction on the glass transition temperature in exposed APEX-E. We find that the glass transition temperature increased linearly by as much as 20 degrees C after complete de-protection matrix. We present a detailed examination of the use of differential thermal analysis to study reaction and the glass transition with a local thermal probe.

Paper Details

Date Published: 25 June 1999
PDF: 5 pages
Proc. SPIE 3676, Emerging Lithographic Technologies III, (25 June 1999); doi: 10.1117/12.351159
Show Author Affiliations
David S. Fryer, Univ. of Wisconsin/Madison (United States)
Juan J. de Pablo, Univ. of Wisconsin/Madison (United States)
Paul F. Nealey, Univ. of Wisconsin/Madison (United States)

Published in SPIE Proceedings Vol. 3676:
Emerging Lithographic Technologies III
Yuli Vladimirsky, Editor(s)

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