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Proceedings Paper

Excimer laser for 157-nm lithography
Author(s): Uwe Stamm; Igor Bragin; Sergei V. Govorkov; Juergen Kleinschmidt; Rainer Paetzel; Evgueni V. Slobodtchikov; Klaus Vogler; Frank Vofl; Dirk Basting
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Paper Abstract

Optical deep UV (DUV) lithography is aiming to reach feature sizes of below 100 nm. The likely choice of the exposure wavelength will be 157 nm, which is emitted by the F2 excimer laser. Experience with this laser type in a variety of applications has been gained at Lambda Physik for the past 20 years. A major breakthrough in performance, in particular laser efficiency and durability, was achieved with the introduction of our metal ceramic laser tube in 1996. In this paper, we report on the progress in the development of the F2 laser light source. A major advance in narrowing the bandwidth of a 10W laser is the achievement of output spectral width of about 1 pm. With a newly developed NovaTube based F2 discharge chamber we show more than 19 million pulses gas lifetime without any additional gas actions. The laser achieves up to 1 kHz repetition rate. Energy stability sigma is 1 percent, dose energy stability 0.5 percent. The performance characteristics as temporal and spatial beam profile and the suitability the laser for microlithography are discussed. Typical lifetimes of the key components and a projection of the present and future cost of operation are presented.

Paper Details

Date Published: 25 June 1999
PDF: 11 pages
Proc. SPIE 3676, Emerging Lithographic Technologies III, (25 June 1999); doi: 10.1117/12.351152
Show Author Affiliations
Uwe Stamm, Lambda Physik GmbH (Germany)
Igor Bragin, Lambda Physik GmbH (Germany)
Sergei V. Govorkov, Lambda Physik, Inc. (United States)
Juergen Kleinschmidt, Lambda Physik GmbH (Germany)
Rainer Paetzel, Lambda Physik GmbH (Germany)
Evgueni V. Slobodtchikov, Lambda Physik Inc. (United States)
Klaus Vogler, Lambda Physik GmbH (Germany)
Frank Vofl, Lambda Physik GmbH (Germany)
Dirk Basting, Lambda Physik GmbH (Germany)


Published in SPIE Proceedings Vol. 3676:
Emerging Lithographic Technologies III
Yuli Vladimirsky, Editor(s)

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