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Proceedings Paper

X-ray mask fabrication at CXrL
Author(s): Quinn J. Leonard; Jaz Bansel; Lei Yang; Olga Vladimirsky; Srinivas B. Bollepalli; Mumit Khan; Yuli Vladimirsky; Franco Cerrina; James Welch Taylor; Klaus Simon; Lynn Charles Rathbun; Richard C. Tiberio
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Paper Abstract

Availability of production-worthy x-ray masks is of great concern to the lithographic community in anticipation of insertion of x-ray lithography as the leading contender among the next generation lithographies.

Paper Details

Date Published: 25 June 1999
PDF: 7 pages
Proc. SPIE 3676, Emerging Lithographic Technologies III, (25 June 1999); doi: 10.1117/12.351147
Show Author Affiliations
Quinn J. Leonard, Univ. of Wisconsin/Madison (United States)
Jaz Bansel, Univ. of Wisconsin/Madison (United States)
Lei Yang, Univ. of Wisconsin/Madison (United States)
Olga Vladimirsky, Univ. of Wisconsin/Madison (United States)
Srinivas B. Bollepalli, Univ. of Wisconsin/Madison (United States)
Mumit Khan, Univ. of Wisconsin/Madison (United States)
Yuli Vladimirsky, Univ. of Wisconsin/Madison (United States)
Franco Cerrina, Univ. of Wisconsin/Madison (United States)
James Welch Taylor, Univ. of Wisconsin/Madison (United States)
Klaus Simon, SAL, Inc. (United States)
Lynn Charles Rathbun, Cornell Univ. (United States)
Richard C. Tiberio, Cornell Univ. (United States)


Published in SPIE Proceedings Vol. 3676:
Emerging Lithographic Technologies III
Yuli Vladimirsky, Editor(s)

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