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Proceedings Paper

Mechanical distortions in advanced optical reticles
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Paper Abstract

Finite element models have been developed and refined to simulate the mechanical distortions associated with mask blank fabrication, pattern transfer, and exposure clamping. By modeling the substrate with layers associated with the mask fabrication process and then by prestressing specified layers, the resulting out-of-plane and in-plane distortions of the mask blank have been determined. Etching procedures were subsequently simulated to assess the pattern transfer distortions associated with both dark and bright field masks. Investigations included substrate materials which have acceptable optical transmission for wavelengths below 180 nm. Additional mechanical distortions associated with clamping the reticle into the exposure mount have also been considered.

Paper Details

Date Published: 25 June 1999
PDF: 12 pages
Proc. SPIE 3676, Emerging Lithographic Technologies III, (25 June 1999); doi: 10.1117/12.351143
Show Author Affiliations
Andrew R. Mikkelson, Univ. of Wisconsin/Madison (United States)
Roxann L. Engelstad, Univ. of Wisconsin/Madison (United States)
Edward G. Lovell, Univ. of Wisconsin/Madison (United States)
Theodore M. Bloomstein, MIT Lincoln Lab. (United States)
Mark E. Mason, Texas Instruments Inc. (United States)


Published in SPIE Proceedings Vol. 3676:
Emerging Lithographic Technologies III
Yuli Vladimirsky, Editor(s)

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