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Proceedings Paper

X-ray and EUV laser-plasma sources based on cryogenic liquid-jet target
Author(s): Lars Rymell; Magnus Berglund; Bjoern A. M. Hansson; Hans M. Hertz
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Paper Abstract

We describe new high-brightness laser-plasma sources for x- ray and extreme UV (EUV) radiation. By utilizing a microscopic liquid-jet or liquid-droplet target the harmful emission of debris is significantly reduced or completely eliminated. The spectrum can be spectrally tailored by choosing a suitable liquid. In this paper we summarize our work on this type of source and include some recent developments on cryogenic liquified gases such as nitrogen and xenon. We believe that this new source is a suitable choice for EUV lithography as well as for proximity x-ray lithography.

Paper Details

Date Published: 25 June 1999
PDF: 4 pages
Proc. SPIE 3676, Emerging Lithographic Technologies III, (25 June 1999); doi: 10.1117/12.351114
Show Author Affiliations
Lars Rymell, Royal Institute of Technology (Sweden)
Magnus Berglund, Royal Institute of Technology (Sweden)
Bjoern A. M. Hansson, Royal Institute of Technology (Sweden)
Hans M. Hertz, Royal Institute of Technology (Sweden)


Published in SPIE Proceedings Vol. 3676:
Emerging Lithographic Technologies III
Yuli Vladimirsky, Editor(s)

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