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Proceedings Paper

Emission from a gas puff target irradiated with a Nd:YAG laser for EUV and x-ray lithography
Author(s): Henryk Fiedorowicz; Hiroyuki Daido; Andrzej Bartnik; Noriyuki Sakaya; Masayuki Suzuki; Viliam Kmetik; Miroslaw Szczurek; Thomas Wilhein
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Paper Abstract

Soft x-ray and extreme-UV emissions form plasmas produced using a gas puff target irradiated with a Nd:YAG laser has been investigated. The use of the gas puff targets, create by pulsed injection of high-density gas through a nozzle, eliminates the production of debris associated with solid targets. Laser pulses of either 0.9 ns or 10 ns time duration with energies up to 0.7 J were used to produce plasmas. Emissions in the 1-22 nm wavelength range from laser-produced gas puff plasma were characterized for various gases. The spectral measurements were performed with the use of grating spectrographs equipped with the back- illuminated CCD camera. The source sizes was measured using the Fresnel zone plate imaging system and the grating spectrograph equipped with a slit placed perpendicularly to the dispersion direction. The obtained results would allow to develop an efficient and debrisless laser-produced radiation source for applications in proximity x-ray lithography and extreme UV lithography technologies.

Paper Details

Date Published: 25 June 1999
PDF: 10 pages
Proc. SPIE 3676, Emerging Lithographic Technologies III, (25 June 1999); doi: 10.1117/12.351112
Show Author Affiliations
Henryk Fiedorowicz, Military Univ. of Technology (Poland)
Hiroyuki Daido, Osaka Univ. (Japan)
Andrzej Bartnik, Military Univ. of Technology (Poland)
Noriyuki Sakaya, Osaka Univ. (Japan)
Masayuki Suzuki, Osaka Univ. (Japan)
Viliam Kmetik, Osaka Univ. (Japan)
Miroslaw Szczurek, Military Univ. of Technology (Poland)
Thomas Wilhein, Georg-August Univ. Goettingen (Germany)


Published in SPIE Proceedings Vol. 3676:
Emerging Lithographic Technologies III
Yuli Vladimirsky, Editor(s)

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