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Proceedings Paper

Design and development of thin film materials for 157-nm and VUV wavelengths: APSM, binary masking, and optical coatings applications
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Paper Abstract

As optical lithography below 193 nm is explored, materials issues become more challenging. Thin film coatings that are sufficient for use at wavelengths near or above 200 nm are more likely than not to be problematic at 157 nm, 126 nm, or other potential VUV wavelengths. The situation is a concern for optical coatings, masking films, and for resist/substrate reflectivity control. Potential solutions for several film types are presented, which have been deposited and optically characterized for use as attenuated phase shift masking films, binary masking films, and optical coatings for use at 157 nm.

Paper Details

Date Published: 25 June 1999
PDF: 10 pages
Proc. SPIE 3676, Emerging Lithographic Technologies III, (25 June 1999); doi: 10.1117/12.351108
Show Author Affiliations
Bruce W. Smith, Rochester Institute of Technology (United States)
Anatoly Bourov, Rochester Institute of Technology (United States)
Lena Zavyalova, Rochester Institute of Technology (United States)
Michael J. Cangemi, Rochester Institute of Technology (United States)


Published in SPIE Proceedings Vol. 3676:
Emerging Lithographic Technologies III
Yuli Vladimirsky, Editor(s)

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