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Proceedings Paper

Optical materials and coatings at 157 nm
Author(s): Theodore M. Bloomstein; Vladimir Liberman; Mordechai Rothschild; D. E. Hardy; Russell B. Goodman
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Paper Abstract

We update previously reported results on the absorption of optical materials and coatings for use in 157 nm based optical projection system. New results include the transmissions spectrum of a modified from of fused silica with suitable initial transmission for use as a mask substrate. We also report on a more systematic study of the effects of surface contaminants on optical components at 157 nm. We have modified our vacuum spectrometer to allow in- situ cleaning to enable a closer examination of purging requirements and cleaning procedures.

Paper Details

Date Published: 25 June 1999
PDF: 8 pages
Proc. SPIE 3676, Emerging Lithographic Technologies III, (25 June 1999); doi: 10.1117/12.351106
Show Author Affiliations
Theodore M. Bloomstein, MIT Lincoln Lab. (United States)
Vladimir Liberman, MIT Lincoln Lab. (United States)
Mordechai Rothschild, MIT Lincoln Lab. (United States)
D. E. Hardy, MIT Lincoln Lab. (United States)
Russell B. Goodman, MIT Lincoln Lab. (United States)

Published in SPIE Proceedings Vol. 3676:
Emerging Lithographic Technologies III
Yuli Vladimirsky, Editor(s)

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