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Proceedings Paper

Extended-source interferometry for at-wavelength testing of EUV optics
Author(s): Matthieu Visser; Martijn K. Dekker; Petra Hegeman; Joseph J. M. Braat
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Paper Abstract

Although EUV-optics can be very accurately tested interferometrically employing a synchrotron, testing with a laser-induced or pinch plasma is attractive because of the lower cost of such sources. Within Philips Research a project has started to build an interferometer employing a laser plasma source and a Ronchi-test which is modified in such a way that two-beam interferograms are obtained. We analyze the accuracy, the vibration and drift sensitivity and the dynamic range of the interferometer for three different combinations of entrance and exit grating by means of computer-generated interferograms. The results are compared with an optical experiment, in which the relevant parameters of the interferometer have been scaled up so that visible light can be used.

Paper Details

Date Published: 25 June 1999
PDF: 11 pages
Proc. SPIE 3676, Emerging Lithographic Technologies III, (25 June 1999); doi: 10.1117/12.351096
Show Author Affiliations
Matthieu Visser, Philips Research Labs. (Netherlands)
Martijn K. Dekker, Philips Research Labs. (Netherlands)
Petra Hegeman, Philips Research Labs. (Netherlands)
Joseph J. M. Braat, Philips Research Labs. (Netherlands)


Published in SPIE Proceedings Vol. 3676:
Emerging Lithographic Technologies III
Yuli Vladimirsky, Editor(s)

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