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Proceedings Paper

Alignment mark detection in CMOS materials with SCALPEL e-beam lithography
Author(s): Reginald C. Farrow; Warren K. Waskiewicz; Isik C. Kizilyalli; Gregg M. Gallatin; James Alexander Liddle; Masis M. Mkrtchyan; Avi Kornblit; Leonidas E. Ocola; Fred P. Klemens; Joseph A. Felker; Christopher J. Biddick; Joseph S. Kraus; Myrtle I. Blakey; Paul A. Orphanos; Nace Layadi; Sailesh M. Merchant
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Paper Abstract

A manufacturable process for fabricating alignment marks that are compatible the SCALPEL lithography system is described. The marks were fabricated in a SiO2/WSi2 structure using SCALPEL lithography and plasma processing. The positions of the marks were detected through e-beam resist in the SCALPEL proof of lithography (SPOL) tool by scanning the image of the corresponding mask mark over the wafer mark and detecting the backscattered electron (BSE) signal. Scans of 1 micrometers line-space patterns yielded mark positions that were repeatable within 20 nm 3(sigma) with a dose of 4 (mu) C/cm2 and signal-to-noise of 32 dB. An analysis shows that the measured repeatability is consistent with a random noise limited response combined with SPOL machine factors. By using a digitally sequenced mark pattern, the capture range of the mark detection was increased to 13 micrometers while maintaining 35 nm 3(sigma) precision. Further improvements in mark detection repeatability are expected when the SCALPEL electron optics is fully optimized.

Paper Details

Date Published: 25 June 1999
PDF: 10 pages
Proc. SPIE 3676, Emerging Lithographic Technologies III, (25 June 1999); doi: 10.1117/12.351093
Show Author Affiliations
Reginald C. Farrow, Lucent Technologies/Bell Labs. (United States)
Warren K. Waskiewicz, Lucent Technologies/Bell Labs. (United States)
Isik C. Kizilyalli, Lucent Technologies/Bell Labs. (United States)
Gregg M. Gallatin, Lucent Technologies/Bell Labs. (United States)
James Alexander Liddle, Lucent Technologies/Bell Labs. (United States)
Masis M. Mkrtchyan, Lucent Technologies/Bell Labs. (United States)
Avi Kornblit, Lucent Technologies/Bell Labs. (United States)
Leonidas E. Ocola, Lucent Technologies/Bell Labs. (United States)
Fred P. Klemens, Lucent Technologies/Bell Labs. (United States)
Joseph A. Felker, Lucent Technologies/Bell Labs. (United States)
Christopher J. Biddick, Lucent Technologies/Bell Labs. (United States)
Joseph S. Kraus, Lucent Technologies/Bell Labs. (United States)
Myrtle I. Blakey, Lucent Technologies/Bell Labs. (United States)
Paul A. Orphanos, Lucent Technologies/Bell Labs. (United States)
Nace Layadi, Lucent Technologies/Bell Labs. (United States)
Sailesh M. Merchant, Lucent Technologies/Bell Labs. (United States)


Published in SPIE Proceedings Vol. 3676:
Emerging Lithographic Technologies III
Yuli Vladimirsky, Editor(s)

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