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Proceedings Paper

Commercial manufacturing of SCALPEL mask blanks
Author(s): Mark D. Walters
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Paper Abstract

In the SCALPEL system developed by Lucent Technologies, a mask consisting of a low atomic number membrane and a high atomic number pattern layer is uniformly illuminated by high energy electrons. Commercialization of the SCALPEL technology requires a manufacturing infrastructure for mask fabrication. This infrastructure is composed of a mask blank supplier who fabricates the membrane mask structure, and a mask patterning facility that writes and etches the patterns into the high atomic number layer. In collaboration with Lucent Technologies, MCNC has developed and implemented a fabrication process and measurement methodology in an effort to establish a commercially viable manufacturing line for SCALPEL mask blanks. This paper presents the process and measurement methodology, measurement result, the key issues associated with this effort.

Paper Details

Date Published: 25 June 1999
PDF: 12 pages
Proc. SPIE 3676, Emerging Lithographic Technologies III, (25 June 1999); doi: 10.1117/12.351086
Show Author Affiliations
Mark D. Walters, Microelectronics Ctr. of North Carolina (United States)

Published in SPIE Proceedings Vol. 3676:
Emerging Lithographic Technologies III
Yuli Vladimirsky, Editor(s)

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