Share Email Print
cover

Proceedings Paper

Commercial manufacturing of SCALPEL mask blanks
Author(s): Mark D. Walters
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

In the SCALPEL system developed by Lucent Technologies, a mask consisting of a low atomic number membrane and a high atomic number pattern layer is uniformly illuminated by high energy electrons. Commercialization of the SCALPEL technology requires a manufacturing infrastructure for mask fabrication. This infrastructure is composed of a mask blank supplier who fabricates the membrane mask structure, and a mask patterning facility that writes and etches the patterns into the high atomic number layer. In collaboration with Lucent Technologies, MCNC has developed and implemented a fabrication process and measurement methodology in an effort to establish a commercially viable manufacturing line for SCALPEL mask blanks. This paper presents the process and measurement methodology, measurement result, the key issues associated with this effort.

Paper Details

Date Published: 25 June 1999
PDF: 12 pages
Proc. SPIE 3676, Emerging Lithographic Technologies III, (25 June 1999); doi: 10.1117/12.351086
Show Author Affiliations
Mark D. Walters, Microelectronics Ctr. of North Carolina (United States)


Published in SPIE Proceedings Vol. 3676:
Emerging Lithographic Technologies III
Yuli Vladimirsky, Editor(s)

© SPIE. Terms of Use
Back to Top