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Proceedings Paper

Finite element modeling of SCALPEL masks
Author(s): Roxann L. Engelstad; Edward G. Lovell; Gerald A. Dicks; Carl J. Martin; Michael P. Schlax; William H. Semke; James Alexander Liddle; Anthony E. Novembre
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Paper Abstract

A virtual mask laboratory has been developed at the UW Computational Mechanics Center to aid in the design and optimization of the SCALPEL mask. Finite element models have been generated to simulate the thermomechanical response of the mask during fabrication, pattern transfer, mounting and exposure. Results on the mask-related distortions can be used to assess image placement accuracy and mask stability; examples of accurate procedures to vectorially sum in-plane distortion maps from the various sources are presented. In addition, experimental methods to provide material properties and stress characterization data are outlined, along with techniques to verify and benchmark the mechanical models.

Paper Details

Date Published: 25 June 1999
PDF: 12 pages
Proc. SPIE 3676, Emerging Lithographic Technologies III, (25 June 1999); doi: 10.1117/12.351085
Show Author Affiliations
Roxann L. Engelstad, Univ. of Wisconsin/Madison (United States)
Edward G. Lovell, Univ. of Wisconsin/Madison (United States)
Gerald A. Dicks, Univ. of Wisconsin/Madison (United States)
Carl J. Martin, Univ. of Wisconsin/Madison (United States)
Michael P. Schlax, Univ. of Wisconsin/Madison (United States)
William H. Semke, Univ. of Wisconsin/Madison (United States)
James Alexander Liddle, Lucent Technologies/Bell Labs. (United States)
Anthony E. Novembre, Lucent Technologies/Bell Labs. (United States)


Published in SPIE Proceedings Vol. 3676:
Emerging Lithographic Technologies III
Yuli Vladimirsky, Editor(s)

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