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Proceedings Paper

Reflectivity of Mo/Si multilayer systems for EUVL
Author(s): Eric Louis; Andrey E. Yakshin; Peter C. Goerts; Salim Abdali; Edward L. G. Maas; R. Stuik; Fred Bijkerk; Detlef Schmitz; Frank Scholze; Gerhard Ulm; Markus Haidl
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Paper Abstract

Normal-incidence reflectivity data of Mo/Si multilayer systems are being reported for the EUV wavelength range.

Paper Details

Date Published: 25 June 1999
PDF: 2 pages
Proc. SPIE 3676, Emerging Lithographic Technologies III, (25 June 1999); doi: 10.1117/12.351079
Show Author Affiliations
Eric Louis, FOM-Institute for Plasma Physics Rijnhuizen (Netherlands)
Andrey E. Yakshin, FOM-Institute for Plasma Physics Rijnhuizeny (Russia)
Peter C. Goerts, FOM-Institute for Plasma Physics Rijnhuizen (Netherlands)
Salim Abdali, FOM-Institute for Plasma Physics Rijnhuizen (Netherlands)
Edward L. G. Maas, FOM-Institute for Plasma Physics Rijnhuizen (Netherlands)
R. Stuik, FOM-Institute for Plasma Physics Rijnhuizen (Netherlands)
Fred Bijkerk, FOM-Institute for Plasma Physics Rijnhuizen (Netherlands)
Detlef Schmitz, Physikalisch-Technische Bundesanstalt (Germany)
Frank Scholze, Physikalisch-Technische Bundesanstalt (Germany)
Gerhard Ulm, Physikalisch-Technische Bundesanstalt (Germany)
Markus Haidl, Carl Zeiss (Germany)


Published in SPIE Proceedings Vol. 3676:
Emerging Lithographic Technologies III
Yuli Vladimirsky, Editor(s)

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