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Proceedings Paper

Accelerated testing technique for evaluating performance of chemical air filters for DUV photolithographic equipment
Author(s): Oleg P. Kishkovich; Dennis Bolgov; William Goodwin
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Paper Abstract

In this paper, the authors discuss the requirements for chemical air filtration system used in conjunction with modern DUV photolithography equipment. Among the topics addressed are the scope of pollutants, their respective internal and external sources, and an overview of different types of filtration technologies currently in use. Key filtration parameters, including removal efficiency, service life, and spill protection capacity, are discussed and supported by actual data, reflection the total molecular base concentration in operational IC manufacturing facilities. The authors also describe a time-accelerated testing procedure for comparing and evaluating different filtration technologies and designs, and demonstrate how this three-day test procedure can reliably predict an effective filter service life up to ten years.

Paper Details

Date Published: 14 June 1999
PDF: 9 pages
Proc. SPIE 3677, Metrology, Inspection, and Process Control for Microlithography XIII, (14 June 1999); doi: 10.1117/12.350874
Show Author Affiliations
Oleg P. Kishkovich, Extraction Systems, Inc. (United States)
Dennis Bolgov, Extraction Systems, Inc. (United States)
William Goodwin, Extraction Systems, Inc. (United States)

Published in SPIE Proceedings Vol. 3677:
Metrology, Inspection, and Process Control for Microlithography XIII
Bhanwar Singh, Editor(s)

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