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Proceedings Paper

Image processing for SEMs: is this the way to go for CD metrology?
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Paper Abstract

Image processing (IP) techniques are growing increasingly powerful. IP has been used extensively in the military field and is finding increased use in semiconductor manufacturing, specifically CD SEM metrology. The IP techniques discussed in this paper address methods that tend to sharpen and smooth the image coming from the scanning electron microscope. One such technique involves deconvolving the effect of a non-ideal electron beam spot. As an example, a vendor supplied IP technique is used to define a methodology to judge the merits of such techniques for critical dimension metrology. Many images were analyzed with and without processing to assess the effects on resolution, accuracy and precision.

Paper Details

Date Published: 14 June 1999
PDF: 11 pages
Proc. SPIE 3677, Metrology, Inspection, and Process Control for Microlithography XIII, (14 June 1999); doi: 10.1117/12.350867
Show Author Affiliations
Eric P. Solecky, IBM Advanced Semiconductor Technology Ctr. (United States)
Charles N. Archie, IBM Advanced Semiconductor Technology Ctr. (United States)


Published in SPIE Proceedings Vol. 3677:
Metrology, Inspection, and Process Control for Microlithography XIII
Bhanwar Singh, Editor(s)

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