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Proceedings Paper

Atomic force microscopy: a diagnostic tool (in) for mask making in the coming years
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Paper Abstract

Mask making in the coming years will face major challenges. Feature measurements in the mask will no longer be restricted to 2D but will require information on the third dimension as well. High precision AFMs will be needed not only for measuring feature dimensions but also as a diagnostic tool for the fabrication of high quality masks.

Paper Details

Date Published: 14 June 1999
PDF: 12 pages
Proc. SPIE 3677, Metrology, Inspection, and Process Control for Microlithography XIII, (14 June 1999); doi: 10.1117/12.350861
Show Author Affiliations
Syed A. Rizvi, Photronics, Inc. (United States)
A. Meyyappan, Digital Instruments, Inc. (United States)


Published in SPIE Proceedings Vol. 3677:
Metrology, Inspection, and Process Control for Microlithography XIII
Bhanwar Singh, Editor(s)

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