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Proceedings Paper

Modeling and experimental aspects of apparent beam width as an edge resolution measure
Author(s): Charles N. Archie; Jeremiah R. Lowney; Michael T. Postek Jr.
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Paper Abstract

The SEMATECH advanced advisory group recently issued a critical dimension (CD) scanning electron microscope (SEM) specification. One component of this specification was the measurement of the apparent beam width (ABW). This measure is essentially an edge width measurement determined from the video profile of a good quality isolated structure of typical semiconductor material like photoresist on antireflective coating on silicon. The waveform is acquired under typical linewidth measurement conditions. The ABW measurement convolutes all the edge resolution-limiting contributors that are present during the linewidth measurement process because it is an actual measurement on a product wafer structure. These factors include beam size, depth of field, autofocus imprecision, astigmatism and electronic filtering in a single measurement. The choice of the ABW artifact, in itself, is also a potential contributor to the measurement and must be fully understood. Using the NIST Monte Carlo modeling program, MONSEL-II, the ABW measurement technique is examined and many contributing factors to measurement variation are studied. Results are compared with experiments using an existing ABW artifact. Furthermore, the requirements for future ABW artifacts are determined and discussed.

Paper Details

Date Published: 14 June 1999
PDF: 17 pages
Proc. SPIE 3677, Metrology, Inspection, and Process Control for Microlithography XIII, (14 June 1999); doi: 10.1117/12.350854
Show Author Affiliations
Charles N. Archie, IBM Microelectronics Div. (United States)
Jeremiah R. Lowney, National Institute of Standards and Technology (United States)
Michael T. Postek Jr., National Institute of Standards and Technology (United States)

Published in SPIE Proceedings Vol. 3677:
Metrology, Inspection, and Process Control for Microlithography XIII
Bhanwar Singh, Editor(s)

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