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Proceedings Paper

Production metrology and control of color filter array photolithography for CMOS imagers
Author(s): Arnold W. Yanof; A. Daou; James P. Annand; M. Pantel; Cliff I. Drowley; John N. Helbert; Carlos L. Ygartua; Clive Hayzelden
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Paper Abstract

The color filter array (CFA) for an image-producing semiconductor device is composed of patterned red-, and green- and blue-colored photoresist structures. CFA photolithography is rather different from that of most semiconductor process levels.

Paper Details

Date Published: 14 June 1999
PDF: 12 pages
Proc. SPIE 3677, Metrology, Inspection, and Process Control for Microlithography XIII, (14 June 1999); doi: 10.1117/12.350821
Show Author Affiliations
Arnold W. Yanof, Motorola (United States)
A. Daou, Motorola (United States)
James P. Annand, Motorola (United States)
M. Pantel, Motorola (United States)
Cliff I. Drowley, Motorola (United States)
John N. Helbert, Motorola (United States)
Carlos L. Ygartua, KLA-Tencor Corp. (United States)
Clive Hayzelden, KLA-Tencor Corp. (United States)


Published in SPIE Proceedings Vol. 3677:
Metrology, Inspection, and Process Control for Microlithography XIII
Bhanwar Singh, Editor(s)

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