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Proceedings Paper

Optimization of the lithographic performance for lift-off processing
Author(s): Wenyan Yin; Ward Fillmore; Kevin J. Dempsey
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Paper Abstract

Shipley MICROPOSIT LOL lift-off technology exploits a develop rate difference in a resist, LOL1000 bi-layer system to generate retrograde profiles. This is an enabling technology for 'additive' processing. Deposition follows lithography and the resist is then 'lifted off' to generate a patterned layer.

Paper Details

Date Published: 11 June 1999
PDF: 8 pages
Proc. SPIE 3678, Advances in Resist Technology and Processing XVI, (11 June 1999); doi: 10.1117/12.350258
Show Author Affiliations
Wenyan Yin, Shipley Co. Inc. (United States)
Ward Fillmore, Shipley Co. Inc. (United States)
Kevin J. Dempsey, Shipley Co. Inc. (United States)

Published in SPIE Proceedings Vol. 3678:
Advances in Resist Technology and Processing XVI
Will Conley, Editor(s)

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