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Proceedings Paper

Chemically amplified resists based on acrylate polymers containing ketal groups in the side chains
Author(s): Jin-Baek Kim; Jong Jin Park; Ji Hyun Jang; Jae-Young Kim
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Paper Abstract

We have examined a novel class of ketal based deep UV photoresist. 1,4-Dioxaspiro(4,4)nonane-2-methyl methacrylate was synthesized and polymerized. A ketal group of poly(1,4- dioxaspiro(4,4)nonane-2-methyl methacrylate) hydrolyzes under acid catalysis to give two alcohol functionalities and a cyclopentanone molecule. The ketal polymer is insoluble in an aqueous developer, while the hydrolyzed products are soluble.It was found the cyclopentanone product affects diffusion of acid in the resist. As a result, the generated cyclopentanone increases mobility of the acid significantly.

Paper Details

Date Published: 11 June 1999
PDF: 8 pages
Proc. SPIE 3678, Advances in Resist Technology and Processing XVI, (11 June 1999); doi: 10.1117/12.350247
Show Author Affiliations
Jin-Baek Kim, Korea Advanced Institute of Science and Technology (South Korea)
Jong Jin Park, Korea Advanced Institute of Science and Technology (South Korea)
Ji Hyun Jang, Korea Advanced Institute of Science and Technology (South Korea)
Jae-Young Kim, Korea Kumho Petrochemical Co., Ltd. (South Korea)


Published in SPIE Proceedings Vol. 3678:
Advances in Resist Technology and Processing XVI
Will Conley, Editor(s)

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