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Proceedings Paper

New polymers for 193-nm single-layer resists based on substituted cycloolefins/maleic anhydride resins
Author(s): Ilya L. Rushkin; Francis M. Houlihan; Janet M. Kometani; Richard S. Hutton; Allen G. Timko; Elsa Reichmanis; Omkaram Nalamasu; Allen H. Gabor; Arturo N. Medina; Sydney G. Slater; Mark O. Neisser
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Paper Abstract

A series of new polymers for 193 nm single layer resist based on maleic anhydride/cycloolefin systems with minimum amount of acrylate units were synthesized. In order to minimize the acrylate content, the cycloolefin moiety of the polymers was functionalized with side groups designed to either promotes adhesion to silicon substrate and/or impart the imaging functionality. All polymers were prepared by free-radical polymerization in moderate to high yields and were characterized by variety of techniques. The initial lithographic evaluation of the new resists was carried out. It was found that acrylates can be successfully replaced with appropriately substituted cycloolefins to provide good resolution. The etch resistance of the new materials generally improves with increase in cycloolefin content. The Onishi and Kunz type plots will be discussed.

Paper Details

Date Published: 11 June 1999
PDF: 7 pages
Proc. SPIE 3678, Advances in Resist Technology and Processing XVI, (11 June 1999); doi: 10.1117/12.350241
Show Author Affiliations
Ilya L. Rushkin, Lucent Technologies/Bell Labs. (United States)
Francis M. Houlihan, Lucent Technologies/Bell Labs. (United States)
Janet M. Kometani, Lucent Technologies/Bell Labs. (United States)
Richard S. Hutton, Lucent Technologies/Bell Labs. (United States)
Allen G. Timko, Lucent Technologies/Bell Labs. (United States)
Elsa Reichmanis, Lucent Technologies/Bell Labs. (United States)
Omkaram Nalamasu, Lucent Technologies/Bell Labs. (United States)
Allen H. Gabor, Arch Chemicals, Inc. (United States)
Arturo N. Medina, Arch Chemicals, Inc. (United States)
Sydney G. Slater, Arch Chemicals, Inc. (United States)
Mark O. Neisser, Arch Chemicals, Inc. (United States)


Published in SPIE Proceedings Vol. 3678:
Advances in Resist Technology and Processing XVI
Will Conley, Editor(s)

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