Share Email Print
cover

Proceedings Paper

Toward individually addressable nanometer-size surface pixels: ultrathin dendrimer films as resists for scanning probe lithography
Author(s): David C. Tully; Alexander R. Trimble; Jean M. J. Frechet; Kathryn Guarini; Calvin F. Quate
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

Scanning probe lithography (SPL) has recently been shown to be a versatile technique for patterning semiconductor surfaces. The intense electric field emanating from the scanning probe tip can be used for the patterning of carbon- based self-assembled monolayers and thin films, as well as the anodization or field-enhanced oxidation of passivated metal surfaces. We have been investigating the use of monolayers and ultra-thin films made from dendritic polymers as resists for SPL. Dendrimer films have ben prepare by both covalent and ionic binding to the wafer surface. Silicon wafers were treated with dendritic chlorosilanes to afford self-assembled monolayer from the functionalized dendrons. Ionically bound dendrimer films were prepared by treating an aminopropylsilane-modified wafer surface with a dendritic carboxylic acid. These ultra-thin dendrimer films were characterized by atomic force microscopy, contact angle goniometry, and optical ellipsometry. The dendrimer films were shown to be effective resist for SPL, and we have patterned negative tone oxide images onto dendrimer modified wafer surfaces. Pattern transfer can be achieved by a selective wet etch resulting in the formation of positive tone images.

Paper Details

Date Published: 11 June 1999
PDF: 6 pages
Proc. SPIE 3678, Advances in Resist Technology and Processing XVI, (11 June 1999); doi: 10.1117/12.350237
Show Author Affiliations
David C. Tully, Univ. of California/Berkeley (United States)
Alexander R. Trimble, Univ. of California/Berkeley (United States)
Jean M. J. Frechet, Univ. of California/Berkeley (United States)
Kathryn Guarini, Stanford Univ. (United States)
Calvin F. Quate, Stanford Univ. (United States)


Published in SPIE Proceedings Vol. 3678:
Advances in Resist Technology and Processing XVI
Will Conley, Editor(s)

© SPIE. Terms of Use
Back to Top