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Proceedings Paper

Lithographic properties of novel acetal-derivatized hydroxy styrene polymers
Author(s): Sanjay Malik; Andrew J. Blakeney; Lawrence Ferreira; Brian Maxwell; Allyn Whewell; Thomas R. Sarubbi; Murrae J. Bowden; Veerle Van Driessche; Toru Fujimori; Shiro Tan; Toshiaki Aoai; Kazuya Uenishi; Yasumasa Kawabe; Tadayoshi Kokubo
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Paper Abstract

Lithographic properties of a variety of acetal-derivatized styrene based polymers are reported. The structural modifications in the polymers involve varying the size of the pendent acetal moiety. the lithographic performances of the resists containing structurally modified acetals were found to be superior to the conventional acetals. In the cases where the acidolysis products of the modified acetals are non-volatile alcohols, the post-exposure volatilization, film shrinkage and plasma etch resistance were found to be significantly improved.

Paper Details

Date Published: 11 June 1999
PDF: 13 pages
Proc. SPIE 3678, Advances in Resist Technology and Processing XVI, (11 June 1999); doi: 10.1117/12.350222
Show Author Affiliations
Sanjay Malik, Arch Chemicals, Inc. (United States)
Andrew J. Blakeney, Arch Chemicals, Inc. (United States)
Lawrence Ferreira, Arch Chemicals, Inc. (United States)
Brian Maxwell, Arch Chemicals, Inc. (United States)
Allyn Whewell, Arch Chemicals, Inc. (United States)
Thomas R. Sarubbi, Arch Chemicals, Inc. (United States)
Murrae J. Bowden, Arch Chemicals, N.V. (United States)
Veerle Van Driessche, Arch Chemicals, Inc. (Belgium)
Toru Fujimori, Fuji Photo Film Co., Ltd. (Japan)
Shiro Tan, Fuji Photo Film Co., Ltd. (Japan)
Toshiaki Aoai, Fuji Photo Film Co., Ltd. (Japan)
Kazuya Uenishi, Fuji Photo Film Co., Ltd. (Japan)
Yasumasa Kawabe, Fuji Photo Film Co., Ltd. (Japan)
Tadayoshi Kokubo, Fuji Film-Olin Co., Ltd. (Japan)


Published in SPIE Proceedings Vol. 3678:
Advances in Resist Technology and Processing XVI
Will Conley, Editor(s)

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