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Proceedings Paper

Novel 193-nm single-layer resist containing a multifunctional monomer
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Paper Abstract

We have newly developed a novel multi-functional monomer. Application of this monomer also allows us to introduce another unit to further improve its etch resistance. Furthermore, our novel resist containing this multi- functional monomer exhibits an excellent adhesion to Si substrate, an improved CD linearity, a high sensitivity, a good contrast, and a high synthetic yield. A 110nm L/S pattern was successfully at 1:2 pitch of a strong PSM was also successfully obtained by using a 2.38wt percent TMAH aqueous solution as a developer.

Paper Details

Date Published: 11 June 1999
PDF: 11 pages
Proc. SPIE 3678, Advances in Resist Technology and Processing XVI, (11 June 1999); doi: 10.1117/12.350206
Show Author Affiliations
Geunsu Lee, Hyundai Electronics Industries Co., Ltd. (South Korea)
Cha-Won Koh, Hyundai Electronics Industries Co., Ltd. (South Korea)
Jae Chang Jung, Hyundai Electronics Industries Co., Ltd. (South Korea)
Min-Ho Jung, Hyundai Electronics Industries Co., Ltd. (South Korea)
Hyeong-Soo Kim, Hyundai Electronics Industries Co., Ltd. (South Korea)
Ki-Ho Baik, Hyundai Electronics Industries Co., Ltd. (United States)
Il-Hyun Choi, Hyundai Electronics Industries Co., Ltd. (South Korea)


Published in SPIE Proceedings Vol. 3678:
Advances in Resist Technology and Processing XVI
Will Conley, Editor(s)

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