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Proceedings Paper

Optimization of 193-nm single-layer resists through statistical design
Author(s): Allen H. Gabor; Ognian N. Dimov; Arturo N. Medina; Mark O. Neisser; Sydney G. Slater; Ruey H. Wang; Francis M. Houlihan; Raymond A. Cirelli; Gary Dabbagh; Richard S. Hutton; Ilya L. Rushkin; James R. Sweeney; Allen G. Timko; Omkaram Nalamasu; Elsa Reichmanis
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Paper Abstract

Through a series of statistical design experiments we optimized the lithographic performance of a 193 nm single layer resists based on a norbornene-maleic anhydride matrix resin. Several interesting findings were found including that having the PEB temperature improved the performance of the resist. The polymer composition was found to strongly influence the lithographic performance of the resist. Variables that we examined included acrylate loading and blocking level. By optimizing the composition of the polymer, we have obtained resist with high etch resistance, square profiles and 0.130 micron dense line ultimate resolution in 0.5 micron thick films. The resist formulations are compatible with industry standard 0.262 N TMAH. During exposure the resists does not suffer from the outgassing of volatile species.

Paper Details

Date Published: 11 June 1999
PDF: 9 pages
Proc. SPIE 3678, Advances in Resist Technology and Processing XVI, (11 June 1999); doi: 10.1117/12.350205
Show Author Affiliations
Allen H. Gabor, Arch Chemicals, Inc. (United States)
Ognian N. Dimov, Arch Chemicals, Inc. (United States)
Arturo N. Medina, Arch Chemicals, Inc. (United States)
Mark O. Neisser, Arch Chemicals, Inc. (United States)
Sydney G. Slater, Arch Chemicals, Inc. (United States)
Ruey H. Wang, Arch Chemicals, Inc. (United States)
Francis M. Houlihan, Lucent Technologies/Bell Labs. (United States)
Raymond A. Cirelli, Lucent Technologies/Bell Labs. (United States)
Gary Dabbagh, Lucent Technologies/Bell Labs. (United States)
Richard S. Hutton, Lucent Technologies/Bell Labs. (United States)
Ilya L. Rushkin, Lucent Technologies/Bell Labs. (United States)
James R. Sweeney, Lucent Technologies/Bell Labs. (United States)
Allen G. Timko, Lucent Technologies/Bell Labs. (United States)
Omkaram Nalamasu, Lucent Technologies/Bell Labs. (United States)
Elsa Reichmanis, Lucent Technologies/Bell Labs. (United States)

Published in SPIE Proceedings Vol. 3678:
Advances in Resist Technology and Processing XVI
Will Conley, Editor(s)

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