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Proceedings Paper

Methacrylate resists and antireflective coatings for 193-nm lithography
Author(s): Gary N. Taylor; Peter Trefonas; Charles R. Szmanda; George G. Barclay; Robert J. Kavanagh; Robert F. Blacksmith; Lori Anne Joesten; Michael J. Monaghan; Suzanne Coley; Zhibiao Mao; James F. Cameron; Ricky Hardy; Dana Gronbeck; S. Connolly
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Paper Abstract

Methacrylates were the first class of resist to be examined for use in 193nm lithography. They are still useful today, but have a very different molecular structure because of the requirements for development in 0.262N tetramethyl ammonium hydroxide and high etching resistance. A major driving force for their continued use is the availability of a wide variety of methacrylate monomers and the use of free racial polymerization which imparts a wide range of properties to the polymers and makes them very cost effective.

Paper Details

Date Published: 11 June 1999
PDF: 12 pages
Proc. SPIE 3678, Advances in Resist Technology and Processing XVI, (11 June 1999); doi: 10.1117/12.350199
Show Author Affiliations
Gary N. Taylor, Shipley Co. Inc. (United States)
Peter Trefonas, Shipley Co. Inc. (United States)
Charles R. Szmanda, Shipley Co. Inc. (United States)
George G. Barclay, Shipley Co. Inc. (United States)
Robert J. Kavanagh, Shipley Co. Inc. (United States)
Robert F. Blacksmith, Shipley Co. Inc. (United States)
Lori Anne Joesten, Shipley Co. Inc. (United States)
Michael J. Monaghan, Shipley Co. Inc. (United States)
Suzanne Coley, Shipley Co. Inc. (United States)
Zhibiao Mao, Shipley Co. Inc. (United States)
James F. Cameron, Shipley Co. Inc. (United States)
Ricky Hardy, Shipley Co. Inc. (United States)
Dana Gronbeck, Shipley Co. Inc. (United States)
S. Connolly, Shipley Co. Inc. (United States)


Published in SPIE Proceedings Vol. 3678:
Advances in Resist Technology and Processing XVI
Will Conley, Editor(s)

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