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Proceedings Paper

Preparation of lower-dispersity fractionated novolak resins by ultracentrifugation
Author(s): Douglas S. McKenzie; Michelle M. Cook; M. Dalil Rahman; Stan F. Wanat; Melodie I. Munoz; Robert K. Fea; Balaji Narasimhan
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Paper Abstract

The need to make well characterized resins consistently is paramount to the preparation of high performance photoresists. Solid resins fractionated by selective precipitation have been separated by ultracentrifugation at varying temperatures. At sufficiently high revolutions per minute, solvents and oligomers are efficiently squeezed out leaving behind polymer with higher average molecular weight and lower dispersity than resins obtained by more common isolation techniques. By controlling isolation conditions, resins with desired dissolution rates could be produced. Lithographic test confirmed that resists properties could effectively be controlled by manipulation of process conditions to isolate resins used in the formulations.

Paper Details

Date Published: 11 June 1999
PDF: 7 pages
Proc. SPIE 3678, Advances in Resist Technology and Processing XVI, (11 June 1999); doi: 10.1117/12.350148
Show Author Affiliations
Douglas S. McKenzie, Clariant Corp. (United States)
Michelle M. Cook, Clariant Corp. (United States)
M. Dalil Rahman, Clariant Corp. (United States)
Stan F. Wanat, Clariant Corp. (United States)
Melodie I. Munoz, Rutgers Univ. (United States)
Robert K. Fea, Rutgers Univ. (United States)
Balaji Narasimhan, Rutgers Univ. (United States)

Published in SPIE Proceedings Vol. 3678:
Advances in Resist Technology and Processing XVI
Will Conley, Editor(s)

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