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Proceedings Paper

Micro-optical elements fabricated and replicated in semiconductor materials
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Paper Abstract

Refractive microoptical elements were originally fabricated by mass-transport smoothing in gallium phosphide. Mass- transport smoothing is based on surface diffusion at elevated temperatures and allows the generation of highly efficient semiconductor microoptics. Starting from a master element, we have developed a replication technique for transferring microoptical surface reliefs into other semiconductor materials, such as gallium arsenide (GaAs). The technique uses a cast and dry etch process. Two different refractive microoptical elements have been replicated into GaAs, a Fresnel biprism and a concave micromirror. The elements have been characterized and show the high fidelity of the replication process.

Paper Details

Date Published: 1 June 1999
PDF: 7 pages
Proc. SPIE 3633, Diffractive and Holographic Technologies, Systems, and Spatial Light Modulators VI, (1 June 1999); doi: 10.1117/12.349337
Show Author Affiliations
Fredrik K. Nikolajeff, Uppsala Univ. (Sweden)
James R. Leger, Univ. of Minnesota/Twin Cities (United States)
Todd A. Ballen, Univ. of Minnesota/Twin Cities (United States)


Published in SPIE Proceedings Vol. 3633:
Diffractive and Holographic Technologies, Systems, and Spatial Light Modulators VI
Ivan Cindrich; Sing H. Lee; Richard L. Sutherland, Editor(s)

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