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Proceedings Paper

Wavefront analysis of photolithographic lenses for wavelengths of 300 to 600 nm
Author(s): Wolfgang Freitag; W. Grossmann
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Paper Abstract

The method of wavefront analysis is based on the metrological simulation of optical ray tracing. Many rays, selected by a pinhole, will be analysed sequentially, so that the transverse ray aberrations measured with a elekironic coordinate-detector can be stored in the computer. Due to low power per ray photon counting must be applied. The aberrations are necessary to start a mathematical analysis by the computer and the result is the wavefront from the lens under test for one point represented by the Niiboer-Zernike-coefficients. This method needs no addditional optics, so it is possible to measure with ligth of any wavelength especially with ultravioleti ligth, too.

Paper Details

Date Published: 1 July 1990
PDF: 1 pages
Proc. SPIE 1319, Optics in Complex Systems, (1 July 1990); doi: 10.1117/12.34902
Show Author Affiliations
Wolfgang Freitag, Jenoptik GmbH (Germany)
W. Grossmann, Jenoptik GmbH (Germany)

Published in SPIE Proceedings Vol. 1319:
Optics in Complex Systems
F. Lanzl; H.-J. Preuss; G. Weigelt, Editor(s)

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