Proceedings PaperWavefront analysis of photolithographic lenses for wavelengths of 300 to 600 nm
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The method of wavefront analysis is based on the metrological simulation of optical ray tracing. Many rays, selected by a pinhole, will be analysed sequentially, so that the transverse ray aberrations measured with a elekironic coordinate-detector can be stored in the computer. Due to low power per ray photon counting must be applied. The aberrations are necessary to start a mathematical analysis by the computer and the result is the wavefront from the lens under test for one point represented by the Niiboer-Zernike-coefficients. This method needs no addditional optics, so it is possible to measure with ligth of any wavelength especially with ultravioleti ligth, too.