Proceedings PaperSystem for quanititative microscopy
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Attempts to extend the range of operation of the microscope beyond conventional resolution limits usually require precise control of light intensity and carefully stabilised laboratory environnnts. The system to be described avoids these problems by the use of comparator microscopy combined with null-photometry. Applications of this quantitative 3D microscope are expected to be in the quality control of microcircuit patterns and the surfaces of precision engineering and optical components and in biology. This development was undertaken to see if optical microscopy could be extended down to the nanotechnology regime and at the same time be suitable for industrial applications preferably on-machine . The first application of this system has been for the measurement of surface flaws such as digs and scratches which can be of nanometre dimensions. Recent results given here denvnstrate the potential of the system for quantifying line widths and measuring surface microtopography.