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Proceedings Paper

Using a computer-generated hologram as a lithographic technique for generating high-density intensity patterns
Author(s): Yasuhiro Takaki
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Paper Abstract

High-density intensity pattern generation by use of a computer-generated hologram is applied to photolithography to make the critical dimension equal to (lambda) /4 NA. This technique enables us to make the critical dimension smaller than 0.1 micrometer by using UV lasers. Preliminary experimental results of CGH lithography are presented.

Paper Details

Date Published: 7 May 1999
PDF: 4 pages
Proc. SPIE 3740, Optical Engineering for Sensing and Nanotechnology (ICOSN '99), (7 May 1999); doi: 10.1117/12.347831
Show Author Affiliations
Yasuhiro Takaki, Nihon Univ. (Japan)


Published in SPIE Proceedings Vol. 3740:
Optical Engineering for Sensing and Nanotechnology (ICOSN '99)
Ichirou Yamaguchi, Editor(s)

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