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Proceedings Paper

Attenuated phase-shifting mask and its encoding method
Author(s): Chongxi Zhou; Feng Boru; Desheng Hou; Jin Zhang
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Paper Abstract

Attenuated phase shifting mask and that with optical proximity correction is adopted to improve resolution of photolithography based on some calculation results. The first factor k1 of the photolithography could be to 0.50, and the optimal transmission is about to 8 to approximately 10%. And a new kind of method of making attenuated phase shifting mask by encoding is put forward, and the theoretical calculation results are accordant to the conventional attenuated shifting mask.

Paper Details

Date Published: 7 May 1999
PDF: 4 pages
Proc. SPIE 3740, Optical Engineering for Sensing and Nanotechnology (ICOSN '99), (7 May 1999); doi: 10.1117/12.347714
Show Author Affiliations
Chongxi Zhou, Institute of Optics and Electronics (China)
Feng Boru, Institute of Optics and Electronics (China)
Desheng Hou, Institute of Optics and Electronics (China)
Jin Zhang, Institute of Optics and Electronics (China)


Published in SPIE Proceedings Vol. 3740:
Optical Engineering for Sensing and Nanotechnology (ICOSN '99)

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