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Proceedings Paper

Process of pulsed-laser deposition of BaTiO3 ferroelectric thin films for device applications
Author(s): Totka D. Kabadjova; Peter A. Atanasov; Rumen I. Tomov; Alexander N. Zherikhin; Dmitre G. Ouzounov
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Paper Abstract

Thin films of BaTiO3 were deposited by KrF excimer laser ablation (248 nm) on Si substrates at different substrate temperatures and various oxygen pressures. The process of ablation of the ceramic BaTiO3 targets were investigated. The composition was measured by EDX microanalysis. The morphology and optical properties of the films were analyzed by SEM and ellipsometry respectively. The dielectric constant was estimated by LCR meter.

Paper Details

Date Published: 7 May 1999
PDF: 5 pages
Proc. SPIE 3571, Tenth International School on Quantum Electronics: Laser Physics and Applications, (7 May 1999); doi: 10.1117/12.347650
Show Author Affiliations
Totka D. Kabadjova, Institute of Electronics (Bulgaria)
Peter A. Atanasov, Institute of Electronics (Bulgaria)
Rumen I. Tomov, Institute of Electronics (Bulgaria)
Alexander N. Zherikhin, Scientific Research Ctr. for Technological Lasers (Russia)
Dmitre G. Ouzounov, Institute of Electronics (United States)


Published in SPIE Proceedings Vol. 3571:
Tenth International School on Quantum Electronics: Laser Physics and Applications
Peter A. Atanasov; Dimitar V. Stoyanov, Editor(s)

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